Product Video
Product Overview
Product Features
Introduction to the features of Molecular Beam Evaporation Source SOURCE-1250:
Molecular beam evaporation source, used for preparing MBE-grown films in ultra-high vacuum;
Open evaporation source, designed to minimize gas emissions during molecular beam radiation;
Mounting flange: ICF070, 114, etc.;
Temperature control: Max1250 controlled via PID.
Product Specifications
Molecular Beam Evaporation Source SOURCE-1250 Specifications:
(1) Crucible capacity: approximately 10cc (lip about 15mm x 57mm);
(2) Crucible material: PBN;
(3) Heater: high purity Ta wire winding;
(4) Side reflector: 5 layers of high purity Ta;
(5) Heater element support base: high purity Mo;
(6) Thermocouple: Pr13;
(7) External shape of heating element: φ35X50mm;
(8) Operating temperature range: 300°C to 1250°C;
(9) Shutter open/close is controlled by a miniature flange rotary feedthrough (standard manual; air-driven is optional);
(10) Mounting flange: 114CF (4.5" CF);
(11) Heating power supply: 1KW DC power supply, with current and voltage limits;
(12) Temperature controller: PID control method, RT~1800°C, maximum control accuracy 0.1°C;
(13) Maximum baking temperature: 250°C (after removing cables and air-driven device).
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